Rapid Growth of Nanostructured Diamond Film on Silicon and Ti–6Al–4V Alloy Substrates
- Univ. of Alabama, Birmingham, AL (United States). Dept. of Physics; DOE/OSTI
- Univ. of Alabama, Birmingham, AL (United States). Dept. of Physics
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Nanostructured diamond (NSD) films were grown on silicon and Ti–6Al–4V alloy substrates by microwave plasma chemical vapor deposition (MPCVD). NSD Growth rates of 5 µm/h on silicon, and 4 µm/h on Ti–6Al–4V were achieved. In a chemistry of H2/CH4/N2, varying ratios of CH4/H2 and N2/CH4 were employed in this research and their effect on the resulting diamond films were studied by X-ray photoelectron spectroscopy, Raman spectroscopy, scanning electron microscopy, and atomic force microscopy. As a result of modifying the stock cooling stage of CVD system, we were able to utilize plasma with high power densities in our NSD growth experiments, enabling us to achieve high growth rates. Substrate temperature and N2/CH4 ratio have been found to be key factors in determining the diamond film quality. NSD films grown as part of this study were shown to contain 85% to 90% sp3 bonded carbon.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division
- Grant/Contract Number:
- AC52-07NA27344
- OSTI ID:
- 1628443
- Journal Information:
- Materials, Journal Name: Materials Journal Issue: 1 Vol. 7; ISSN 1996-1944; ISSN MATEG9
- Publisher:
- MDPICopyright Statement
- Country of Publication:
- United States
- Language:
- English
Morphological Transition in Diamond Thin-Films Induced by Boron in a Microwave Plasma Deposition Process
|
journal | November 2017 |
The Role of Ambient Gas and Pressure on the Structuring of Hard Diamond-Like Carbon Films Synthesized by Pulsed Laser Deposition
|
journal | June 2015 |
Investigation of diamond deposition on the diamond, silicon and quartz substrates by microwave plasma chemical vapor deposition and Monte Carlo simulations
|
journal | July 2019 |
Similar Records
Interface characterization of chemically vapor deposited diamond on titanium and Ti-6Al-4V
Structure and stress evaluation of diamond films deposited on Ti-6Al-4V alloy at low temperature using CH{sub 4}/O{sub 2}/H{sub 2} and CO/H{sub 2} gas mixtures