Low-temperature diamond growth in a microwave discharge

Journal Article · Mon Dec 25 04:00:00 EST 1989 · Applied Physics Letters; (USA)

DOI:https://doi.org/10.1063/1.101939· OSTI ID:6986118

Hsu, W L; Tung, D M; Fuchs, E A; McCarty, K F ^[1]; Joshi, A; Nimmagadda, R ^[2]

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1. Sandia National Laboratories, Livermore, California 94551-0969 (USA)
2. Lockheed Research Center, Org. 93-10, Palo Alto, California 94304 (USA)

A new regime for plasma-assisted chemical vapor deposition (CVD) of diamond is reported in which high quality diamond films can be deposited on silicon with relatively high ratios of methane in hydrogen mixtures and at significantly lower substrate temperatures than previously reported. The deposition was achieved in a microwave plasma discharge with a feed gas consisting of a mixture of only methane and hydrogen. The surface temperature of a molybdenum sample, when exposed to the same plasma environment, was measured at 500 {degree}C with an infrared scanning camera. This substrate temperature is substantially lower than the 700--1000 {degree}C range generally regarded as the optimal regime for CVD diamond growth. Analysis by Raman spectroscopy showed that films deposited with a 2% methane in hydrogen mixture produced a near graphite-free diamond film at our reported low-temperature regime, while deposition at 1000 {degree}C resulted in films with a much higher graphitic content.

• OSTI ID: 6986118
• Journal Information: Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 55:26; ISSN APPLA; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
360602 -- Other Materials-- Structure & Phase Studies
ALKANES
CARBON
CHEMICAL COATING
CHEMICAL COMPOSITION
CHEMICAL VAPOR DEPOSITION
COATINGS
CRYSTAL STRUCTURE
DEPOSITION
DIAMONDS
ELEMENTAL MINERALS
ELEMENTS
FILMS
GRAPHITE
HIGH TEMPERATURE
HYDROCARBONS
HYDROGEN COMPOUNDS
LASER SPECTROSCOPY
METALS
METHANE
MINERALS
MOLYBDENUM
NONMETALS
ORGANIC COMPOUNDS
PLASMA
RAMAN SPECTROSCOPY
SPECTROSCOPY
SURFACE COATING
THIN FILMS
TRANSITION ELEMENTS
VAPOR DEPOSITED COATINGS
VERY HIGH TEMPERATURE