skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Improvement of hot-carrier and radiation hardnesses in metal-oxide-nitride-oxide semiconductor devices by irradiation-then-anneal treatments

Journal Article · · IEEE Transactions on Electron Devices (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/16.278518· OSTI ID:7027230
 [1];  [2]
  1. National Tsing Hua Univ., Hsinchu (Taiwan, Province of China). Dept. of Nuclear Engineering
  2. National Taiwan Univ., Taipei (Taiwan, Province of China). Dept. of Electrical Engineering

The hardnesses of hot-carrier and radiation of metal-oxide nitride-oxide semiconductor (MONOS) devices can be improved by the irradiation-then-anneal (ITA) treatments. Each treatment includes an irradiation of Co-60 with a total dose of 1M rads(SiO[sub 2]) and an anneal in N[sub 2] at 400 C for 10 min successively. This improvement can be explained by the release of SiO[sub 2]/Si interfacial strain.

OSTI ID:
7027230
Journal Information:
IEEE Transactions on Electron Devices (Institute of Electrical and Electronics Engineers); (United States), Vol. 41:4; ISSN 0018-9383
Country of Publication:
United States
Language:
English