Superconducting structure with layers of niobium nitride and aluminum nitride
A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources. 8 figs.
- DOE Contract Number:
- AC02-84GC20057
- Assignee:
- Univ. of Chicago, IL (United States)
- Patent Number(s):
- A; US 4844989
- Application Number:
- PPN: US 7-027928
- OSTI ID:
- 7014343
- Country of Publication:
- United States
- Language:
- English
Similar Records
Effects of methane in the deposition of superconducting niobium nitride thin films at ambient substrate temperature
NbN tunnel junctions
Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM COMPOUNDS
ALUMINIUM NITRIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ELECTRONIC EQUIPMENT
ENERGY BEAM DEPOSITION
EQUIPMENT
FABRICATION
JOSEPHSON JUNCTIONS
JUNCTIONS
MICROWAVE EQUIPMENT
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN COMPOUNDS
PNICTIDES
REFRACTORY METAL COMPOUNDS
SPUTTERING
SUPERCONDUCTING JUNCTIONS
SUPERCONDUCTORS
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS