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Effects of methane in the deposition of superconducting niobium nitride thin films at ambient substrate temperature

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.332117· OSTI ID:6631045
Thin films of the niobium-carbon-nitrogen system have been prepared at ambient substrate temperature by rf diode reactive sputtering in an argon-nitrogen atmosphere with controlled amounts of methane added to the sputter gas. Superconducting transition temperatures ranged from approximately 11 to 15.85 /sup 0/K. Auger and x-ray diffraction analysis indicate that all films were of the single phase B1 structure with a small amount of ..beta..-phase hexagonal structure in the very low carbon containing films. A correlation of the superconducting properties, room temperature sheet resistance, preferred crystallite orientation, and film composition was observed. The results of this investigation show that high T/sub c/ niobium nitride/niobium carbonitride thin films can be prepared at ambient substrate temperatures with the proper amount of nitrogen and methane partial pressures during film deposition. These films have potential application for the fabrication of high T/sub c/ Josephson tunnel junctions.
Research Organization:
Microwave Technology Branch, Electronics Technology Division, Naval Research Laboratory, Washington, DC 20375
OSTI ID:
6631045
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 54:2; ISSN JAPIA
Country of Publication:
United States
Language:
English