Preparation of niobium nitride and niobium carbonitride thin films by reactive sputtering
Conference
·
OSTI ID:4086680
- eds.
The preparation of niobium nitride and carbonitride thin films by reactive sputtering either of a niobium or niobium-carbon target under partial pressure of nitrogen or nitrogen + methane has been studied. The influence of the experimental conditions on composition, structure, and electrical properties of the deposited materials are investigated in each case. The correlations observed between the nature of the deposited materials and their superconductive properties are related. 11 fig. (auth)
- Research Organization:
- CEN, Grenoble, France
- NSA Number:
- NSA-33-015214
- OSTI ID:
- 4086680
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
*NIOBIUM CARBIDES-- CHEMICAL PREPARATION
*NIOBIUM NITRIDES-- CHEMICAL PREPARATION
360201* --Materials--Ceramics
Cermets & Refractories-- Preparation & Fabrication
ATMOSPHERES
CARBONITRIDES
CHEMICAL COMPOSITION
CRITICAL CURRENT
FILMS
METHANE
N50120* --Metals
Ceramics
& Other Materials--Ceramics & Cermets--Preparation & Fabrication
NITROGEN
SPUTTERING
SUPERCONDUCTIVITY
TRANSITION TEMPERATURE
*NIOBIUM NITRIDES-- CHEMICAL PREPARATION
360201* --Materials--Ceramics
Cermets & Refractories-- Preparation & Fabrication
ATMOSPHERES
CARBONITRIDES
CHEMICAL COMPOSITION
CRITICAL CURRENT
FILMS
METHANE
N50120* --Metals
Ceramics
& Other Materials--Ceramics & Cermets--Preparation & Fabrication
NITROGEN
SPUTTERING
SUPERCONDUCTIVITY
TRANSITION TEMPERATURE