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Properties and structure of thin films of niobium nitride prepared by reactive cathode sputtering. I. Preparation and properties (in French)

Journal Article · · J. Less-Common Metals, v. 35, pp. 181-192
OSTI ID:4309381
The formation of thin films of niobium nitride by reactive sputtering is described. The influence of the various parameters empioyed in the preparation on the composition, structure and electrical properties (resistivity, temperature coefficient and critical temperature) of these films was investigated. The maximum observed critical temperature (15.85 deg K) corresponds to the formation of the stoichiometric compound niobium nitride. The existence of a material of composition Nb/sub 1-x/N (0 < x < 0.34) with the same structure as delta -Nb was also observed. (9 figures, 5 tables). ( auth)
Research Organization:
CEN, Grenoble, France
NSA Number:
NSA-29-024617
OSTI ID:
4309381
Journal Information:
J. Less-Common Metals, v. 35, pp. 181-192, Journal Name: J. Less-Common Metals, v. 35, pp. 181-192; ISSN JCOMA
Country of Publication:
Country unknown/Code not available
Language:
French