Composition and structure of niobium nitride and carbonitride films obtained by reactive sputtering

Journal Article · Wed Jan 01 04:00:00 EST 1975 · Vide, v. 30, no. 175, pp. 1-17

OSTI ID:4118368

Aubert, A; Spitz, J

The elaboration of niobium nitride and carbonitride thin films by reactive sputtering of a niobium or niobium-carbon target under partial pressure of nitrogen or nitrogen+methane has been studied. The influence of the experimental conditions on the structure and electrical properties of the deposited materials are investigated in each case. The methods used for determining the composition and structure are described. The correlations observed between the nature of deposited materials and their superconducting properties are related. (FR)

• Research Organization: CEA Centre d'Etudes Nucleaires de Grenoble, 38 (France). Dept. de Metallurgie
• NSA Number: NSA-33-012564
• OSTI ID: 4118368
• Journal Information: Vide, v. 30, no. 175, pp. 1-17, Journal Name: Vide, v. 30, no. 175, pp. 1-17; ISSN VIDEA
• Country of Publication: France
• Language: French

Related Subjects

*NIOBIUM CARBIDES-- ELECTRICAL PROPERTIES
*NIOBIUM NITRIDES-- ELECTRICAL PROPERTIES
360202* --Materials--Ceramics
Cermets & Refractories-- Structure & Phase Studies
CATHODE SPUTTERING
CHEMICAL ANALYSIS
CHEMICAL COMPOSITION
FILMS
N50120 --Metals
Ceramics
& Other Materials--Ceramics & Cermets--Preparation & Fabrication
N50130* --Metals
Ceramics
& Other Materials--Ceramics & Cermets--Properties
Structure & Phase Studies
N66200 --Physics (Low Temperature)--Superconductivity
PRESSURE DEPENDENCE
SUPERCONDUCTIVITY
TEMPERATURE DEPENDENCE