High T/sub c/ YBa/sub 2/Cu/sub 3/O/sub 7/. sqrt. /sub x/ thin films on Si substrates by dc magnetron sputtering from a stoichiometric oxide target
Thin films of YBa/sub 2/Cu/sub 3/O/sub 7/..sqrt../sub x/ were deposited on Si substrates at 600--700 /sup 0/C by dc magnetron sputtering from a stoichiometric oxide target. Resistivity measurement results indicate that these films are superconducting with a zero resistance T/sub c/ as high as 76 K, without further high-temperature post-annealing treatments. These films give both core and valence-band x-ray photoemission, and x-ray diffraction spectra similar to those for superconducting films prepared with a high-temperature post-annealing step. No significant diffusion of Si from the substrate into the film was detected for the films deposited at 650 /sup 0/C or lower, according to depth profiles obtained using secondary ion mass spectrometry.
- Research Organization:
- IBM Almaden Research Center, San Jose, California 95120
- OSTI ID:
- 7006853
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 52:26; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ALKALINE EARTH METAL COMPOUNDS
BARIUM COMPOUNDS
BARIUM OXIDES
CHALCOGENIDES
COPPER COMPOUNDS
COPPER OXIDES
DEPOSITION
DIFFUSION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELEMENTS
EMISSION
FILMS
HIGH TEMPERATURE
LOW TEMPERATURE
OXIDES
OXYGEN COMPOUNDS
PHOTOEMISSION
PHYSICAL PROPERTIES
SECONDARY EMISSION
SEMIMETALS
SILICON
SPUTTERING
SUPERCONDUCTING FILMS
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
VERY HIGH TEMPERATURE
YTTRIUM COMPOUNDS
YTTRIUM OXIDES