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U.S. Department of Energy
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Iii-v semiconductor quantum-well lasers and related opto-electronic devices on silicon. Technical report

Technical Report ·
OSTI ID:7001870

The research goal is to further develop quantum well heterostructure (QWH) lasers and to realize reliable Al(x)Ga(1-x)As-GaAs QWH lasers on Si. In spite of the significant lattice and thermal expansion mismatch between GaAs and Si, the idea of splicing III-V semiconductor technology, i.e., optoelectronics and photonics, onto Si has obvious appeal. Adding to this is the fact, as shown earlier in this work, that cw 300 K Al(x)Ga(1-x)As-GaAs QWH lasers can be grown on Si, and that the Si substrate serves as a better heat sink than GaAs. This makes possible the right-side-up heat sinking needed for electronic-photonic integrated circuits. This report contains research results on quantum well heterostructures on Si, impurity-induced layer disordering, phonon-assisted laser operations and other laser studies.

Research Organization:
Illinois Univ., Urbana, IL (USA)
OSTI ID:
7001870
Report Number(s):
AD-A-216980/3/XAB; TR--2
Country of Publication:
United States
Language:
English