Development and fabrication of a solar cell junction processing system. Quarterly progress report No. 3, October 1980
The basic objectives of the program are the following: (1) to design, develop, construct and deliver a junction processing system which will be capable of producing solar cell junctions by means of ion implantation followed by pulsed electron beam annealing; (2) to include in the system a wafer transport mechanism capable of transferring 4-inch-diameter wafers into and out of the vacuum chamber where the ion implantation and pulsed electron beam annealing processes take place; (3) to integrate, test and demonstrate the system prior to its delivery to JPL along with detailed operating and maintenance manuals; and (4) to estimate component lifetimes and costs, as necessary for the contract, for the performance of comprehensive analyses in accordance with the Solar Array Manufacturing Industry Costing Standards (SAMICS). Under this contract the automated junction formation equipment to be developed involves a new system design incorporating a modified, government-owned, JPL-controlled ion implanter into a spire-developed pulsed electron beam annealer and wafer transport system. When modified, the ion implanter will deliver a 16 mA beam of /sup 31/P/sup +/ ions with a fluence of 2.5 x 10/sup 15/ ions per square centimeter at an energy of 10 keV. The throughput design goal rate for the junction processor is 10/sup 7/ four-inch-diameter wafers per year. Work on the pulsed electron beam subsystem development is described. (WHK)
- Research Organization:
- Spire Corp., Bedford, MA (USA)
- DOE Contract Number:
- NAS-7-100-955640
- OSTI ID:
- 6991851
- Report Number(s):
- DOE/JPL/955640-80/3
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
07 ISOTOPE AND RADIATION SOURCES
070201 -- Radiation Sources-- Design
Fabrication & Operation
14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
ANNEALING
BEAM PULSERS
BEAMS
CHARGED PARTICLES
DESIGN
DIRECT ENERGY CONVERTERS
ELECTRON BEAMS
ELECTRON SOURCES
ENERGY RANGE
EQUIPMENT
HEAT TREATMENTS
ION IMPLANTATION
ION SOURCES
IONS
IRRADIATION
JUNCTIONS
KEV RANGE
KEV RANGE 01-10
LEPTON BEAMS
PARTICLE BEAMS
PARTICLE SOURCES
PHOSPHORUS IONS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PULSED IRRADIATION
RADIATION SOURCES
SEMICONDUCTOR JUNCTIONS
SOLAR CELLS
SOLAR EQUIPMENT
070201 -- Radiation Sources-- Design
Fabrication & Operation
14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
ANNEALING
BEAM PULSERS
BEAMS
CHARGED PARTICLES
DESIGN
DIRECT ENERGY CONVERTERS
ELECTRON BEAMS
ELECTRON SOURCES
ENERGY RANGE
EQUIPMENT
HEAT TREATMENTS
ION IMPLANTATION
ION SOURCES
IONS
IRRADIATION
JUNCTIONS
KEV RANGE
KEV RANGE 01-10
LEPTON BEAMS
PARTICLE BEAMS
PARTICLE SOURCES
PHOSPHORUS IONS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PULSED IRRADIATION
RADIATION SOURCES
SEMICONDUCTOR JUNCTIONS
SOLAR CELLS
SOLAR EQUIPMENT