Laser probes and numerical modeling as process diagnostics in chemical vapor deposition
The chemical vapor deposition process consists of a chemically reacting flow in which the fluid mechanics and chemical kinetics are strongly coupled. Laser probes such as Raman spectroscopy and laser induced fluorescence can be used to measure gas temperature fields and chemical species concentrations, but often the interpretation of such data is difficult because several interacting chemical and physical phenomena are occurring simultaneously. Detailed numerical modeling of the experimental system under study provides valuable insights into these interactions and allows one to make useful comparisons between experiment and the model to gain a fundamental understanding of the CVD process. Examples of this approach are given for silicon deposition from silane and fluid mechanics diagnostics in a rotating disk CVD reactor. 19 refs., 8 figs.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (USA); Sandia National Labs., Livermore, CA (USA)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 6976383
- Report Number(s):
- SAND-88-1313C; CONF-880408-26; ON: DE88011622
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360601* -- Other Materials-- Preparation & Manufacture
CHEMICAL COATING
CHEMICAL REACTORS
CHEMICAL VAPOR DEPOSITION
DEPOSITION
DIAGNOSTIC TECHNIQUES
ELEMENTS
FLUID MECHANICS
HYDRIDES
HYDROGEN COMPOUNDS
MATHEMATICAL MODELS
MECHANICS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SIMULATION
SURFACE COATING