Reactive ion beam etching of ZnSe and ZnS epitaxial films using Cl sub 2 electron cyclotron resonance plasma

Journal Article · Mon Feb 26 04:00:00 EST 1990 · Applied Physics Letters; (USA)

DOI:https://doi.org/10.1063/1.102678· OSTI ID:6964290

Saitoh, T; Yokogawa, T; Narusawa, T ^[1]

---

1. Opto-Electronics Research Laboratory, Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd., 3-15, Yagumo-nakamachi, Moriguchi, Osaka 570, (Japan)

Reactive ion beam etching of ZnSe and ZnS epitaxial films was carried out using pure Cl{sub 2} as an etching gas. Electron cyclotron resonance plasma was excited at pressures of 2.5{times}10{sup {minus}4} --2.5{times}10{sup {minus}3} Torr. Chlorine ions were extracted with voltages of 0--400 V. Sputtering yields were strongly dependent on the extraction voltage and the gas pressure. The etching mechanism starts with the generation of chloride compounds, mainly ZnCl{sub {ital x}}, by the chemical reaction of the surface and chlorine radicals, mainly Cl atoms. The chloride compounds are subsequently sputtered off by the accelerated ion beam. The crystalline quality of etched ZnSe films was characterized by photoluminescence measurements. We found that high quality etched films, which have almost no damage and no Cl contamination, can be obtained at an extraction voltage of about 300 V.

• OSTI ID: 6964290
• Journal Information: Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:9; ISSN APPLA; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BEAMS
CHALCOGENIDES
CHLORIDES
CHLORINE
CHLORINE COMPOUNDS
COLLISIONS
CYCLOTRON RESONANCE
DAMAGE
DATA
ELECTRON CYCLOTRON-RESONANCE
ELEMENTS
ETCHING
EXPERIMENTAL DATA
FILMS
HALIDES
HALOGEN COMPOUNDS
HALOGENS
INFORMATION
INORGANIC PHOSPHORS
ION BEAMS
ION COLLISIONS
MEDIUM VACUUM
NONMETALS
NUMERICAL DATA
PHOSPHORS
RESONANCE
SELENIDES
SELENIUM COMPOUNDS
SPUTTERING
SULFIDES
SULFUR COMPOUNDS
SURFACE FINISHING
THIN FILMS
ZINC CHLORIDES
ZINC COMPOUNDS
ZINC HALIDES
ZINC SELENIDES
ZINC SULFIDES