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Title: Nanometer-scale patterning of high-[ital T][sub [ital c]] superconductors for Josephson junction-based digital circuits

Journal Article · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
DOI:https://doi.org/10.1116/1.587480· OSTI ID:6937602
; ;  [1]; ; ; ;  [2]; ;  [3]
  1. Sandia National Laboratories, Albuquerque, New Mexico 87185-0603 (United States)
  2. Conductus, Sunnyvale, California 94086 (United States)
  3. AT T Bell Laboratories, Murray Hill, New Jersey 07974 (United States)

A straightforward method for nanometer-scale patterning of high-[ital T][sub [ital c]] superconductor thin films is discussed. The technique combines direct-write electron beam lithography with well-controlled aqueous etches and is applied to the fabrication of Josephson junction nanobridges in high-quality, epitaxial thin-film YBa[sub 2]Cu[sub 3]O[sub 7]. We present the results of our studies of the dimensions, yield, uniformity, and mechanism of the junctions along with the performance of a representative digital circuit based on these junctions. Direct current junction parameter statistics measured at 77 K show critical currents of 27.5 [mu]A[plus minus]13% for a sample set of 220 junctions. The Josephson behavior of the nanobridge is believed to arise from the aggregation of oxygen vacancies in the nanometer-scale bridge.

DOE Contract Number:
AC04-94AL85000
OSTI ID:
6937602
Journal Information:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Vol. 12:6; ISSN 0734-211X
Country of Publication:
United States
Language:
English