Very Large Scale Integration of Nano-Patterned YBa2Cu3O7-delta Josephson Junctions in a Two-Dimensional Array

Journal Article · Tue Sep 01 00:00:00 EDT 2009 · Nano Letters

OSTI ID:974180

Cybart, Shane A; Anton, Steven; Wu, Stephen; Clarke, John; Dynes, Robert

Very large scale integration of Josephson junctions in a two-dimensional series-parallel array has been achieved by ion irradiating a YBa{sub 2}Cu{sub 3}O{sub 7-{delta}} film through slits in a nano-fabricated mask created with electron beam lithography and reactive ion etching. The mask consisted of 15,820 high-aspect ratio (20:1), 35-nm wide slits that restricted the irradiation in the film below to form Josephson junctions. Characterizing each parallel segment k, containing 28 junctions, with a single critical current I{sub ck} we found a standard deviation in I{sub ck} of about 16%.

• Research Organization: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
• Sponsoring Organization: Materials Sciences Division
• DOE Contract Number: AC02-05CH11231
• OSTI ID: 974180
• Report Number(s): LBNL-2684E
• Journal Information: Nano Letters, Journal Name: Nano Letters
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
CRITICAL CURRENT
ELECTRON BEAMS
ETCHING
IRRADIATION
JOSEPHSON JUNCTIONS
YBCO Josephson Junctions