Plasma- and gas-surface interactions during the chemical vapor deposition of tungsten from H/sub 2//WF/sub 6/
Ion and neutral species were sampled from a H/sub 2//WF/sub 6/ tungsten deposition atmosphere (with and without plasma enhancement) by a line-of-sight quadrupole mass spectrometer and cylindrical mirror ion energy analyzer. These diagnostics were used to investigate the influence of neutral and ion flux on the resistivity and morphology of ..cap alpha..- and ..beta..-tungsten films. In all depositions, WF, WF/sub 2/, and WF/sub 6/ were the principle tungsten-fluorine species while WF/sup +//sub 5/ was the primary plasma-generated ion. Variation of ..cap alpha..-tungsten film properties with thickness was dominated by impurities and defects incorporated early in the deposition and by domain size. Plasma-enhanced chemical vapor-deposited films exhibited lower resistivity, and higher temperature coefficient of resistivity and domain size compared to low-pressure chemical vapor deposition films. The variation of ..cap alpha..-tungsten properties with increasing ion-bombardment energies was consistent with enhanced sputtering and damage production. Low-resistivity small-domain films were deposited at low frequencies while low-energy high-current bombardment conditions were conducive to domain growth. Nucleation and growth of ..beta.. tungsten required oxygen rather than fluorine impurities.
- Research Organization:
- University of California, Berkeley, California 94720
- OSTI ID:
- 6936652
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 64:9; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360101* -- Metals & Alloys-- Preparation & Fabrication
ATMOSPHERES
CHEMICAL COATING
CHEMICAL REACTION KINETICS
CHEMICAL VAPOR DEPOSITION
COLLISIONS
CONTROLLED ATMOSPHERES
DEPOSITION
ELECTRIC DISCHARGES
ELECTRON COLLISIONS
ELECTRON-ION COLLISIONS
ELEMENTS
FLUORIDES
FLUORINE COMPOUNDS
GLOW DISCHARGES
HALIDES
HALOGEN COMPOUNDS
ION COLLISIONS
KINETICS
MASS SPECTROSCOPY
METALS
REACTION KINETICS
REFRACTORY METAL COMPOUNDS
SPECTROSCOPY
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN
TUNGSTEN COMPOUNDS
TUNGSTEN FLUORIDES