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Converting a bulk radiation-hardened BiCMOS technology into a dielectrically-isolated process

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:6907995
 [1]; ;  [2];  [3]
  1. Analog Devices Semiconductor, Wilmington, MA (United States)
  2. Naval Surface Warfare Center, Crane, IN (United States)
  3. RLP Research, Inc., Albuquerque, NM (United States)

RBCMOS (Radiation-hardened Bipolar CMOS) is a 10-volt, junction-isolated, radiation-hardened BiCMOS process developed at Analog Devices. It is a radiation-hardened version of Analog Devices' commercial Advanced Bipolar CMOS (ABCMOS) process. Both of these processes are designed for advanced mixed-signal circuits such as high-performance D/A and A/D converters. To improve the dose-rate performance of the process, the DI version is being developed. The isolation scheme employed is similar to that used on state-of-the-art commercial complementary-bipolar processes. The starting material is a bonded wafer SOI substrate. Full oxide isolation is achieved with deep trenches that are filled with a combination of oxide and polysilicon. Excellent transistor yield has been demonstrated. The DI process exhibits improved performance in high dose-rate environments, including higher upset thresholds, and improved recovery times. The addition of the oxide isolation did not introduce any radiation sensitivites.

OSTI ID:
6907995
Report Number(s):
CONF-930704--
Journal Information:
IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 40:6Pt1; ISSN 0018-9499; ISSN IETNAE
Country of Publication:
United States
Language:
English

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