Formation of WSi/sub 2/ at the Si-W(110) interface
Journal Article
·
· Phys. Rev. B: Condens. Matter; (United States)
Photoemission, Auger, and work-function measurements of room-temperature deposition of Si on W(110) show that Si interacts strongly with W and forms WSi/sub 2/ at the interface. As the formation of WSi/sub 2/ continues with increasing coverages of Si, silicon oxide species accumulate gradually on top of the surface due to the presence of O impurities. These species eventually form a thin oxide layer and hinder the formation of WSi/sub 2/ in the interfacial region.
- Research Organization:
- Physics Department, Brookhaven National Laboratory, Upton, New York 11973
- OSTI ID:
- 6891072
- Journal Information:
- Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 29:4; ISSN PRBMD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
30 DIRECT ENERGY CONVERSION
300304* -- Thermoelectric Generators-- Applications
AUGER ELECTRON SPECTROSCOPY
CHALCOGENIDES
DATA
ELECTRON SPECTROSCOPY
ELECTRONIC STRUCTURE
ELEMENTS
EXPERIMENTAL DATA
FUNCTIONS
INFORMATION
INTERFACES
MASS SPECTROMETERS
MEASURING INSTRUMENTS
MEDIUM TEMPERATURE
METALS
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
SEMIMETALS
SILICIDES
SILICON
SILICON COMPOUNDS
SILICON OXIDES
SPECTROMETERS
SPECTROSCOPY
SYNTHESIS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN
TUNGSTEN COMPOUNDS
TUNGSTEN SILICIDES
ULTRAHIGH VACUUM
WORK FUNCTIONS
300304* -- Thermoelectric Generators-- Applications
AUGER ELECTRON SPECTROSCOPY
CHALCOGENIDES
DATA
ELECTRON SPECTROSCOPY
ELECTRONIC STRUCTURE
ELEMENTS
EXPERIMENTAL DATA
FUNCTIONS
INFORMATION
INTERFACES
MASS SPECTROMETERS
MEASURING INSTRUMENTS
MEDIUM TEMPERATURE
METALS
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
SEMIMETALS
SILICIDES
SILICON
SILICON COMPOUNDS
SILICON OXIDES
SPECTROMETERS
SPECTROSCOPY
SYNTHESIS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN
TUNGSTEN COMPOUNDS
TUNGSTEN SILICIDES
ULTRAHIGH VACUUM
WORK FUNCTIONS