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Interface formation and growth of InSb on Si(100)

Journal Article · · Physical Review, B: Condensed Matter; (United States)
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  1. Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801 (United States) Materials Research Laboratory, University of Illinois at Urbana-Champaign, 104 South Goodwin Avenue, Urbana, Illinois 61801 (United States)

High-energy electron diffraction, Auger spectroscopy, photoemission, and x-ray diffraction were used to study the interface and subsequent growth of InSb on vicinal (4{degree} off) and on-axis Si(100). During the initial stages of molecular-beam epitaxy at 410 {degree}C, we examined the In, Sb, and Si core levels as a function of In and Sb coverage and deposition order. Based on these results, a model for interface formation is developed. Thicker coverage results of coevaporated InSb are discussed in light of the interfacial analyses.

DOE Contract Number:
FG02-91ER45439
OSTI ID:
7207170
Journal Information:
Physical Review, B: Condensed Matter; (United States), Journal Name: Physical Review, B: Condensed Matter; (United States) Vol. 45:7; ISSN PRBMD; ISSN 0163-1829
Country of Publication:
United States
Language:
English