Ion beam sputtering of in situ superconducting Y-Ba-Cu-O films
- EIC Laboratories, Norwood, Massachusetts 02062 (USA)
Oriented superconducting YBa{sub 2}Cu{sub 3}O{sub 7} thin films were deposited on yttria stabilized zirconia and SrTiO{sub 3} substrates by ion-beam sputtering of a nonstoichiometric oxide target. The films exhibited zero-resistance critical temperatures as high as 83.5 K without post-deposition anneals. Both the deposition rate and the {ital c}-lattice parameter data displayed two distinct regimes of dependence on the beam power of the ion source. Low-power sputtering yielded films with large {ital c}-dimensions and low {ital T}{sub {ital c}}'s. Higher-power sputtering produced a continuous decrease in the {ital c}-lattice parameter and increase in critical temperature. Films having the smaller {ital c}-lattice parameters were Cu rich. The Cu content of films deposited at beam voltages of 800 V and above increased with increasing beam power.
- OSTI ID:
- 6883792
- Journal Information:
- Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:10; ISSN 0021-8979; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ALKALINE EARTH METAL COMPOUNDS
BARIUM COMPOUNDS
BARIUM OXIDES
BEAMS
CHALCOGENIDES
COPPER COMPOUNDS
COPPER OXIDES
FILMS
ION BEAMS
LATTICE PARAMETERS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
QUANTITY RATIO
SPUTTERING
SUPERCONDUCTORS
THERMODYNAMIC PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TRANSITION TEMPERATURE
YTTRIUM COMPOUNDS
YTTRIUM OXIDES