Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Ion beam sputtering of in situ superconducting Y-Ba-Cu-O films

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.345161· OSTI ID:6883792
; ;  [1]
  1. EIC Laboratories, Norwood, Massachusetts 02062 (USA)

Oriented superconducting YBa{sub 2}Cu{sub 3}O{sub 7} thin films were deposited on yttria stabilized zirconia and SrTiO{sub 3} substrates by ion-beam sputtering of a nonstoichiometric oxide target. The films exhibited zero-resistance critical temperatures as high as 83.5 K without post-deposition anneals. Both the deposition rate and the {ital c}-lattice parameter data displayed two distinct regimes of dependence on the beam power of the ion source. Low-power sputtering yielded films with large {ital c}-dimensions and low {ital T}{sub {ital c}}'s. Higher-power sputtering produced a continuous decrease in the {ital c}-lattice parameter and increase in critical temperature. Films having the smaller {ital c}-lattice parameters were Cu rich. The Cu content of films deposited at beam voltages of 800 V and above increased with increasing beam power.

OSTI ID:
6883792
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:10; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English