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Ion beam deposition of in situ superconducting Y-Ba-Cu-O films

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.103292· OSTI ID:6955010
; ;  [1]
  1. EIC Laboratories, Norwood, Massachusetts 02062 (US)
Oriented superconducting YBa{sub 2}Cu{sub 3}O{sub 7} thin films were deposited on yttria-stabilized zirconia substrates by ion beam sputtering of a nonstoichiometric oxide target. The films exhibited zero-resistance critical temperatures as high as 80.5 K without post-deposition anneals. Both the deposition rate and the {ital c} lattice parameter data displayed two distinct regimes of dependence on the beam power of the ion source. Low-power sputtering yielded films with large {ital c} dimensions and low {ital T}{sub {ital c}}'s. Higher power sputtering produced a continuous decrease in the {ital c} lattice parameter and an increase in critical temperatures.
OSTI ID:
6955010
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:4; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English