Studies of the interface composition of TiN films formed by plasma-assisted chemical vapor deposition using an in-situ scratching device

Conference · Tue Apr 21 00:00:00 EDT 1987

OSTI ID:6872052

Hilton, M R; Middlebrook, A M; Rodrigues, G; Salmeron, M; Somorjai, G A

The interfacial composition of plasma-assisted chemical vapor deposited TiN films on M2 tool steel is reported. An In-situ scratcher with a scratch adhesion test type diamond stylus was used to create scratches in ultrahigh vacuum (UHV). Auger electron spectroscopy analysis of the adhesive mode failures revealed a sharp chlorine concentration gradient at the exposed surface representing the prior interface. The scratch removal technique data are compared to sputter depth profile data. Scanning electron microscopy and energy dispersive spectroscopy investigation of the scratches following the UHV work is also presented and discussed.

• Research Organization: California Univ., Berkeley (USA)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 6872052
• Report Number(s): LBL-21425; CONF-860495-9; ON: DE87006041
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ADHESION
ALLOYS
AUGER ELECTRON SPECTROSCOPY
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CHLORINE
COATINGS
CUTTING TOOLS
DEPOSITION
DEPTH
DIMENSIONS
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELEMENTS
FAILURES
FILMS
HALOGENS
INTERFACES
IRON ALLOYS
IRON BASE ALLOYS
MATERIALS
MICROSCOPY
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
PNICTIDES
PROTECTIVE COATINGS
SCANNING ELECTRON MICROSCOPY
SPECTROSCOPY
STEELS
SURFACE COATING
TITANIUM COMPOUNDS
TITANIUM NITRIDES
TOOLS
TRANSITION ELEMENT COMPOUNDS