Role of nitrogen ions in ion-beam reactive sputtering of NbN

Journal Article · Tue May 01 04:00:00 EDT 1990 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

DOI:https://doi.org/10.1116/1.576912· OSTI ID:6817997

Lichtenwalner, D J; Anderson, A C ^[1]; Rudman, D A ^[2]

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1. Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173 (USA)
2. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA (USA)

Using ion-beam reactive sputtering of a niobium target, we have studied the effects of energetic-nitrogen-ion bombardment on the target reaction and on the resulting NbN film properties. Nitrogen is either added into the ion source with the noble gas to obtain a beam of nitrogen and argon ions, or injected directly into the chamber as neutral molecules so the ion beam is composed of essentially all argon. The target reaction rate is seen to be controlled by the adsorbed thermal nitrogen, and only minimally affected by the presence of ionized nitrogen. Thus, argon-ion bombardment of the target is responsible for stimulating the reaction between the adsorbed nitrogen and the metal target producing the NbN layer. However, the film properties are affected by the presence of nitrogen ions. Films grown with N{sub 2} added in the ion source have a higher resistivity and lower superconducting transition temperature than films grown with N{sub 2} injected directly into the chamber. These differences increase with N{sub 2} flow; the differences are attributed to damage of the growing film by energetic nitrogen reflecting from the target, as measured by an energetic-neutral-particle detector.

• OSTI ID: 6817997
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 8:3; ISSN 0734-2101; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
656100 -- Condensed Matter Physics-- Superconductivity
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ADSORPTION
ARGON IONS
BEAMS
CHARGED PARTICLES
COATINGS
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ENERGY BEAM DEPOSITION FILMS
FILMS
ION BEAMS
IONS
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN COMPOUNDS
NITROGEN IONS
PHYSICAL PROPERTIES
PNICTIDES
REFRACTORY METAL COMPOUNDS
SORPTION
SPUTTERING
SUPERCONDUCTING FILMS
THERMODYNAMIC PROPERTIES
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSITION TEMPERATURE