Dc and rf magnetron sputter deposition of NbN films with simultaneous control of the nitrogen consumption

Journal Article · Tue Mar 15 04:00:00 EST 1988 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.341113· OSTI ID:5489624

Hedbabny, H; Rogalla, H

To obtain high-quality NbN films with reproducible properties standard dc and rf magnetron sputter-deposition techniques were applied. As a sputtering gas a mixture of nitrogen and argon was used. The actual amount of nitrogen in the chamber is monitored by a differentially pumped mass spectrometer. The dependence of the nitrogen partial pressure on the amount of nitrogen injected into the chamber and the electrical power yields information about the target reaction with the nitrogen. In order to find the best preparation parameters, the interdependence between electrical sputtering power, nitrogen flow, nitrogen consumption, and the superconducting properties of the NbN films was investigated.

• Research Organization: Institute fuer Angew. Physik der Justus-Liebig, Universitaet Giessen, Heinrich-Buff-Ring 16, D-6300 Giessen, Federal Republic of Germany
• OSTI ID: 5489624
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 63:6; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
656100 -- Condensed Matter Physics-- Superconductivity
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
DATA
DEPOSITION
ELECTRON TUBES
ELECTRONIC EQUIPMENT
EQUIPMENT
EXPERIMENTAL DATA
FILMS
INFORMATION
MAGNETRONS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
PNICTIDES
REFRACTORY METAL COMPOUNDS
SPUTTERING
SUPERCONDUCTING FILMS
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS