NbN thin films reactively sputtered with a high-field direct-current magnetron

Journal Article · Fri Jul 01 04:00:00 EDT 1988 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.575579· OSTI ID:7078530

Deen, M J; Landheer, D; Wade, J D; Sproule, G I; Denhoff, M D

The chemical (Auger electron spectroscopy) and electrical characterizations of NbN thin films reactively sputtered with a high-field dc magnetron under varying conditions are described. The films were deposited onto polished silicon and glass substrates which were maintained at close to ambient temperature. A study of the chemical composition, transition temperature, transition width, and sheet resistance ratio was made to determine the optimum conditions for the NbN thin-film preparation. The transition temperature and sheet resistance ratio increases monotonically as the oxygen content of the films decreases and the NbN thin films approach stoichiometry. For films deposited by sputtering at 490 W with 15% nitrogen, 85% argon at 6.6-mTorr total pressure, the transition temperature was 14.7 K, the transition width was 0.2 K, the sheet resistance ratio was 0.90, and the composition was nearly stoichiometric with <1 at. % oxygen and <1 at. % carbon contamination.

• Research Organization: School of Engineering Science, Simon Fraser University, Burnaby, British Columbia, Canada V5A 1S6
• OSTI ID: 7078530
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 6:4; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201 -- Ceramics
Cermets
&amp; Refractories-- Preparation &amp; Fabrication
360204* -- Ceramics
Cermets
&amp; Refractories-- Physical Properties
656100 -- Condensed Matter Physics-- Superconductivity
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ARGON
CHEMICAL COMPOSITION
COATINGS
CONTAMINATION
DATA
DEPOSITION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
EXPERIMENTAL DATA
FABRICATION
FILMS
FLUIDS
GASES
GLASS
INFORMATION
MAGNETRONS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN
NITROGEN COMPOUNDS
NONMETALS
NUMERICAL DATA
PHYSICAL PROPERTIES
PNICTIDES
RARE GASES
REFRACTORY METAL COMPOUNDS
SEMIMETALS
SILICON
SPUTTERING
STOICHIOMETRY
SUPERCONDUCTING FILMS
SURFACE COATING
THERMODYNAMIC PROPERTIES
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSITION TEMPERATURE
VAPOR DEPOSITED COATINGS
VERY LOW TEMPERATURE