The ion-beam reactive sputtering process for deposition of niobium nitride thin films

Thesis/Dissertation · Mon Jan 01 04:00:00 EST 1990

OSTI ID:5343933

Lichtenwalner, D J

Ion-beam reactive sputtering was used to examine the reaction processes and the sputtering processes relevant to the deposition of Nb and NbN thin films. It was determined that the Nb target readily reacts with neutral N{sub 2} molecules, with the reaction rate limited by the N{sub 2} arrival rate and sticking probability. The ion scattering spectroscopy (ISS) analysis also indicates that the target is nearly completely covered with nitrogen when sufficient N{sub 2} is present, which is much different than the expected surface coverage when sputtering a compound target. Analysis of the target surface using secondary-ion mass spectrometry (SIMS) reveals that the nitrogen at the target chemically reacts with the Nb. Sputtering ions are observed to have energies nearly independent of the incident ion energy or sputtering gas (argon or xenon). The properties of NbN films deposited on SiO{sub 2} are also dependent on the deposition parameters, but the {Tc} can not be increased above {approximately}12 K by altering the sputtering conditions alone. The {Tc} of NbN can be increased by depositing on single crystal MgO substrates, or by adding carbon during growth on heated SiO{sub 2} or MgO substrates.

• Research Organization: Massachusetts Inst. of Tech., Cambridge, MA (United States)
• OSTI ID: 5343933
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
ALKALINE EARTH METAL COMPOUNDS
CHALCOGENIDES
COATINGS
CRITICAL TEMPERATURE
DEPOSITION
ELEMENTS
ENERGY BEAM DEPOSITION
ENERGY BEAM DEPOSITION FILMS
FILMS
MAGNESIUM COMPOUNDS
MAGNESIUM OXIDES
METALS
NIOBIUM
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PNICTIDES
REFRACTORY METAL COMPOUNDS
SILICON COMPOUNDS
SILICON OXIDES
SPUTTERING
SURFACE COATING
THERMODYNAMIC PROPERTIES
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TRANSITION TEMPERATURE