Reflection mask defect repair

Conference · Tue Sep 01 04:00:00 EDT 1992

OSTI ID:6780970

Hawryluk, A M ^[1]; Stewart, D ^[2]

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1. Lawrence Livermore National Lab., CA (United States)
2. Micrion Corp., Peabody, MA (United States)

The authors have developed a new technique for the repair of opaque defects on soft x-ray projection lithography reflection masks using ion beam etching and a thin silicon overcoat on the multilayer mirror. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. The procedure uses a beam of [open quotes]low[close quotes] atomic number ions (Si or Ar) of reduced beam energy, and a thin Si overcoat to protect the multilayer mirror.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: DOE; USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6780970
• Report Number(s): UCRL-JC-111714; CONF-9204120--7; ON: DE93014113
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
ARSENIC
ATOMIC NUMBER
BEAMS
DEFECTS
ELECTROMAGNETIC RADIATION
ELECTRONIC CIRCUITS
ELEMENTS
ETCHING
INTEGRATED CIRCUITS
ION BEAMS
IONIZING RADIATIONS
MASKING
MICROELECTRONIC CIRCUITS
MIRRORS
RADIATIONS
REFLECTION
REPAIR
SEMIMETALS
SILICON
SOFT X RADIATION
SURFACE FINISHING
X RADIATION