Reflection mask defect repair

Conference · Tue Sep 01 04:00:00 EDT 1992

OSTI ID:10157223

Hawryluk, A M ^[1]; Stewart, D ^[2]

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1. Lawrence Livermore National Lab., CA (United States)
2. Micrion Corp., Peabody, MA (United States)

The authors have developed a new technique for the repair of opaque defects on soft x-ray projection lithography reflection masks using ion beam etching and a thin silicon overcoat on the multilayer mirror. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. The procedure uses a beam of {open_quotes}low{close_quotes} atomic number ions (Si or Ar) of reduced beam energy, and a thin Si overcoat to protect the multilayer mirror.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 10157223
• Report Number(s): UCRL-JC--111714; CONF-9204120--7; ON: DE93014113
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
426000
ARSENIC
ATOMIC NUMBER
COMPONENTS
ELECTRON DEVICES AND CIRCUITS
DEFECTS
ETCHING
INTEGRATED CIRCUITS
ION BEAMS
MASKING
MIRRORS
REFLECTION
REPAIR
SILICON
SOFT X RADIATION