Reflection mask defect repair

Journal Article · Wed Dec 01 04:00:00 EST 1993 · Applied Optics; (United States)

DOI:https://doi.org/10.1364/AO.32.007012· OSTI ID:5335276

Hawryluk, A M ^[1]; Stewart, D ^[2]

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1. Lawrence Livermore National Laboratory, University of California, Livermore, California 94551 (United States)
2. Micrion Corporation, Peabody, Massachusetts 01960 (United States)

We developed a new technique for the repair of opaque defects on soft-x-ray projection lithography reflection masks by using ion-beam etching and a thin Si overcoat on the multilayer mirror. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. Our procedure uses a beam of low atomic number ions (Si or Ar) of reduced beam energy and a thin Si overcoat to protect the multilayer mirror.

• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5335276
• Journal Information: Applied Optics; (United States), Journal Name: Applied Optics; (United States) Vol. 32:34; ISSN APOPAI; ISSN 0003-6935
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
ARGON IONS
BEAMS
CHARGED PARTICLES
COATINGS
ELECTROMAGNETIC RADIATION
ETCHING
ION BEAMS
IONIZING RADIATIONS
IONS
MASKING
RADIATIONS
REFLECTIVE COATINGS
REPAIR
SILICON IONS
SOFT X RADIATION
SURFACE FINISHING
X RADIATION