Repair of opaque defects on reflection masks for soft x-ray projection lithography

Conference · Sun Nov 01 04:00:00 EST 1992

OSTI ID:10161346

Hawryluk, A M ^[1]; Stewart, D ^[2]

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1. Lawrence Livermore National Lab., CA (United States)
2. Micrion Corp., Peabody, MA (United States)

We have developed a new technique for the repair of opaque defects on soft x-ray projection lithography reflection masks using ion beam etching. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. Our procedure uses a thin, Si overcoat to protect the multilayers from the kinetic energy of the in beam, reduced ion beam energy, and a Ar or Si ion beam to avoid absorption losses.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 10161346
• Report Number(s): UCRL-JC--112163; CONF-920575--1; ON: DE93015114
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601
42 ENGINEERING
426000
COMPONENTS
ELECTRON DEVICES AND CIRCUITS
DEFECTS
ETCHING
FABRICATION
INTEGRATED CIRCUITS
ION BEAMS
MASKING
PREPARATION AND MANUFACTURE
PROTECTIVE COATINGS
SILICON
SOFT X RADIATION