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Compositional disordering of GaAs/AlGaAs multiple quantum wells using ion bombardment at elevated temperatures

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.99934· OSTI ID:6780443
A new method has been developed for compositional mixing of heterostructures by ion bombardment at elevated temperatures. Complete mixing of a 1-..mu..m-thick GaAs/AlGaAs 40-period multiple quantum well layer has been achieved by bombardment with 380 keV Ne/sup +/ ions for 1 h with the sample at 700 /sup 0/C. This temperature is much lower than the annealing temperatures used in other vacancy-enhanced disordering techniques, and even lower temperatures and shorter durations should be possible. Compositional disordering is verified by sputter-profile Auger electron spectroscopy and transmission electron microscopy. Complete mixing is also demonstrated by optical transmission spectra of the disordered material, which exhibit the same band edge as a uniform alloy with the average aluminum mole fraction of the multiple quantum well layer.
Research Organization:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173
OSTI ID:
6780443
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 53:17; ISSN APPLA
Country of Publication:
United States
Language:
English