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Use of tertiarybutylarsine in the fabrication of GaAs/AlGaAs quantum wells and quantum well lasers

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.103595· OSTI ID:6376571
; ; ; ;  [1]
  1. Department of Electrical Engineering, University of Southern California, Los Angeles, CA (USA) Center for Photonic Technology, University of Southern California, Los Angeles, CA (USA)
Tertiarybutylarsine was used in the growth of GaAs and AlGaAs by metalorganic chemical vapor deposition over a range of compositions and V/III ratios. GaAs layers were obtained with both {ital n}- and {ital p}-type background carrier concentrations in the low 10{sup 14} cm{sup {minus}3} range. AlGaAs was grown at 20, 30, and 50% compositions, and photoluminescence of the Al{sub 0.2}Ga{sub 0.8}As indicates high quality material with full width half maximum (FWHM) values of the peaks being comparable to arsine-grown AlGaAs. High quality multiple Al{sub 0.3}Ga{sub 0.7}As/GaAs quantum wells of various widths produced photoluminescence spectra with FWHM values comparable to arsine-grown samples. Minority-carrier lifetimes as long as 400 ns were measured for a heterostructure of 0.5 {mu}m GaAs with Al{sub 0.3}Ga{sub 0.7}As barrier layers. Graded index separate confinement heterostructure lasers were fabricated, and broad- area test results of these devices produced threshold current densities as low as 186 A/cm{sup 2}.
OSTI ID:
6376571
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 57:7; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English