Fabry--Perot reflectance modulator for 1. 3 [mu]m from (InAlGa)As materials grown at low temperature
Journal Article
·
· Applied Physics Letters; (United States)
- Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
We report the first all-semiconductor Fabry--Perot-cavity reflectance modulators operating at wavelengths of 1.32--1.33 [mu]m. These devices were grown on a GaAs substrate using an intermediate, linearly graded InGaAs buffer layer terminating in an In[sub 0.33]Ga[sub 0.67]As layer. The Bragg reflector stacks of the Fabry--Perot structure are composed of InGaAs and InAlAs layers lattice matched to the buffer, and the active cavity region is an In[sub 0.4]Ga[sub 0.6]As/In[sub 0.26]Al[sub 0.35]Ga[sub 0.39]As strained-layer superlattice. The key to obtaining device-quality material was low temperature growth ([similar to]400 [degree]C) of the entire structure. For a device with a 0.38-[mu]m-thick active region and a 4 dB insertion loss, we obtained a contrast ratio of [similar to]3:1 at 4 V bias.
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 6767565
- Journal Information:
- Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 62:9; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
Similar Records
Strain-relaxed InGaAs buffer layers grown by molecular-beam epitaxy for 1.3 {mu}m Fabry-Perot optical modulators
Strain-relaxed InGaAs buffer layers grown by molecular-beam epitaxy for 1. 3 [mu]m Fabry-Perot optical modulators
Novel reflectance modulator employing an InGaAs/AlGaAs strained-layer superlattice Fabry--Perot cavity with unstrained InGaAs/InAlAs mirrors
Conference
·
Wed Dec 30 23:00:00 EST 1992
·
OSTI ID:10134087
Strain-relaxed InGaAs buffer layers grown by molecular-beam epitaxy for 1. 3 [mu]m Fabry-Perot optical modulators
Conference
·
Tue Dec 31 23:00:00 EST 1991
·
OSTI ID:7072072
Novel reflectance modulator employing an InGaAs/AlGaAs strained-layer superlattice Fabry--Perot cavity with unstrained InGaAs/InAlAs mirrors
Journal Article
·
Mon Apr 15 00:00:00 EDT 1991
· Applied Physics Letters; (USA)
·
OSTI ID:5528465
Related Subjects
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
BRAGG REFLECTION
EPITAXY
FABRY-PEROT INTERFEROMETER
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GROWTH
HETEROJUNCTIONS
INDIUM ARSENIDES
INDIUM COMPOUNDS
INTERFEROMETERS
JUNCTIONS
MEASURING INSTRUMENTS
MOLECULAR BEAM EPITAXY
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
PNICTIDES
REFLECTION
REFLECTIVITY
SEMICONDUCTOR DEVICES
SEMICONDUCTOR JUNCTIONS
SUPERLATTICES
SURFACE PROPERTIES
TEMPERATURE EFFECTS
360601 -- Other Materials-- Preparation & Manufacture
42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
BRAGG REFLECTION
EPITAXY
FABRY-PEROT INTERFEROMETER
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
GROWTH
HETEROJUNCTIONS
INDIUM ARSENIDES
INDIUM COMPOUNDS
INTERFEROMETERS
JUNCTIONS
MEASURING INSTRUMENTS
MOLECULAR BEAM EPITAXY
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
PNICTIDES
REFLECTION
REFLECTIVITY
SEMICONDUCTOR DEVICES
SEMICONDUCTOR JUNCTIONS
SUPERLATTICES
SURFACE PROPERTIES
TEMPERATURE EFFECTS