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Trapping parameters of dangling bonds in hydrogenated amorphous silicon

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.93400· OSTI ID:6751641
The mobility, lifetime, and capture cross sections for the trapping of electrons and holes at dangling bond defects in a-Si:H are measured using time-of-flight transient photoconductivity. The magnitude obtained for the product ..mu..tauN/sub s/ is 3.5 x 10/sup 8/ +- 25% cm/sup -1/ V/sup -1/ and 4 x 10/sup 7/ +- 50% cm/sup -1/ V/sup -1/ for electrons and holes, respectively. The capture cross section is 4 x 10/sup -15/ cm/sup 2/ for electrons and about 2 x 10/sup -15/ cm/sup 2/ for holes. The results are consistent with the amphoteric nature of neutral dangling bonds.
Research Organization:
Xerox Palo Alto Research Center, Palo Alto, California 94304
OSTI ID:
6751641
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 41:11; ISSN APPLA
Country of Publication:
United States
Language:
English