Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Influence of dangling bond defects on recombination in a-Si:H

Conference ·
OSTI ID:6466399
Time resolved photoinduced absorption (PIA) and steady state photoconductivity experiments (PC) are used to study recombination processes in electron-irradiated hydrogenated amorphous silicon (a-Si:H). Defect densities measured by ESR range from 5 x 10/sup 15//cm/sup 3/ to 10/sup 18//cm/sup 3/. It is found that while increasing the dangling bond density reduces the PC, the PIA decay rate increases. The results are discussed in the context of a recombination model where the defect density determines whether the carriers recombine through a fast bimolecular or a slower monomolecular process.
Research Organization:
Lawrence Berkeley Lab., CA (USA)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6466399
Report Number(s):
LBL-20184; CONF-8509201-2; ON: DE86002874
Country of Publication:
United States
Language:
English