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Influence of dangling-bond defects on recombination in a-Si:H

Journal Article · · Phys. Rev. B: Condens. Matter; (United States)
Time-resolved photoinduced absorption (PIA) and steady-state photoconductivity (PC) experiments are used to study recombination processes in electron-irradiated hydrogenated amorphous silicon (a-Si:H). Defect densities measured by ESR range from 5 x 10/sup 15//cm/sup 3/ to 10/sup 18//cm/sup 3/. It is found that while increasing the dangling-bond density reduces the PC, the PIA decay rate increases. The results are discussed in the context of a recombination model where the defect density determines whether the carriers recombine through a fast bimolecular or a slower monomolecular process.
Research Organization:
Applied Physics and Laser Spectroscopy Group, Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720
OSTI ID:
5701208
Journal Information:
Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 31:10; ISSN PRBMD
Country of Publication:
United States
Language:
English