Radio-frequency magnetron sputtering of pure and mixed targets of Li[sub 4]SiO[sub 4], Li[sub 3]PO[sub 4], and Li[sub 2]O

Journal Article · Mon Mar 01 00:00:00 EST 1993 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.578739· OSTI ID:6728033

Dudney, N J; Bates, J B ^[1]; Robertson, J D ^[2]

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1. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6030 (United States)
2. Department of Chemistry, University of Kentucky, Lexington, Kentucky 40506 (United States)

Pure and mixed targets of Li[sub 4]SiO[sub 4], Li[sub 3]PO[sub 4], and Li[sub 2]O were sputtered in both argon and argon/oxygen process gases using a 1-in. diam radio-frequency planar magnetron source. The appearance of the sputter target, the self-bias voltage of the target, the film deposition rate, and the optical emission of the plasma were monitored during film growth. The films were analyzed by energy dispersive x-ray spectrometry, proton induced gamma emission, and atomic spectrometry. Films grown from targets of Li[sub 3]PO[sub 4] were found to be near stoichiometric. In contrast, films grown from targets of, or containing, Li[sub 4]SiO[sub 4] were lithium deficient due to the decomposition and segregation of Li[sub 2]O away from the sputtered area on the surface of the target. A similar redistribution of material was observed for Li[sub 2]O targets as well. Reproducible and homogeneous film compositions with stoichiometric lithium concentrations can best be achieved by codeposition with independently controlled sputter sources onto a rotating substrate.

• OSTI ID: 6728033
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Vol. 11:2; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
LITHIUM OXIDES
SPUTTERING
LITHIUM PHOSPHATES
LITHIUM SILICATES
MAGNETRONS
SEGREGATION
STOICHIOMETRY
THIN FILMS
ALKALI METAL COMPOUNDS
CHALCOGENIDES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
EQUIPMENT
FILMS
LITHIUM COMPOUNDS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
OXIDES
OXYGEN COMPOUNDS
PHOSPHATES
PHOSPHORUS COMPOUNDS
SILICATES
SILICON COMPOUNDS
360601* - Other Materials- Preparation & Manufacture