Sputter deposition of lithium silicate - lithium phosphate amorphous electrolytes
Conference
·
OSTI ID:6083968
- Oak Ridge National Lab., TN (USA)
- Kentucky Univ., Lexington, KY (USA). Dept. of Chemistry
Thin films of an amorphous lithium-conducting electrolyte were deposited by rf magnetron sputtering of ceramic targets containing Li{sub 4}SiO{sub 4} and Li{sub 3}PO{sub 4}. The lithium content of the films was found to depend more strongly on the nature and composition of the targets than on many other sputtering parameters. For targets containing Li{sub 4}SiO{sub 4}, most of the lithium was found to segregate away from the sputtered area of the target. Codeposition using two sputter sources achieves a high lithium content in a controlled and reproducible film growth. 10 refs., 4 figs.
- Research Organization:
- Oak Ridge National Lab., TN (USA)
- Sponsoring Organization:
- DOE/ER
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 6083968
- Report Number(s):
- CONF-901105-78; ON: DE91006603
- Country of Publication:
- United States
- Language:
- English
Similar Records
Radio-frequency magnetron sputtering of pure and mixed targets of Li[sub 4]SiO[sub 4], Li[sub 3]PO[sub 4], and Li[sub 2]O
Plasma diagnostic studies of the influence of process variable upon the atomic and molecular species ejected from (1 minus x )Li sub 4 SiO sub 4 : x Li sub 3 PO sub 4 targets during radio frequency magnetron sputtering
Plasma diagnostic studies of the influence of process variables upon the atomic and molecular species ejected from (1-x)Li sub 4 SiO sub 4 :xLi sub 3 PO sub 4 targets during rf-magnetron sputtering
Journal Article
·
Sun Feb 28 23:00:00 EST 1993
· Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
·
OSTI ID:6728033
Plasma diagnostic studies of the influence of process variable upon the atomic and molecular species ejected from (1 minus x )Li sub 4 SiO sub 4 : x Li sub 3 PO sub 4 targets during radio frequency magnetron sputtering
Journal Article
·
Wed May 01 00:00:00 EDT 1991
· Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
·
OSTI ID:5616569
Plasma diagnostic studies of the influence of process variables upon the atomic and molecular species ejected from (1-x)Li sub 4 SiO sub 4 :xLi sub 3 PO sub 4 targets during rf-magnetron sputtering
Conference
·
Sun Dec 31 23:00:00 EST 1989
·
OSTI ID:6413410
Related Subjects
36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
656003 -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALKALI METAL COMPOUNDS
AMORPHOUS STATE
DEPOSITION
ELECTROLYTES
EMISSION SPECTRA
FILMS
LITHIUM COMPOUNDS
LITHIUM PHOSPHATES
LITHIUM SILICATES
OXYGEN COMPOUNDS
PHOSPHATES
PHOSPHORUS COMPOUNDS
SILICATES
SILICON COMPOUNDS
SPECTRA
SPUTTERING
THIN FILMS
360601* -- Other Materials-- Preparation & Manufacture
656003 -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALKALI METAL COMPOUNDS
AMORPHOUS STATE
DEPOSITION
ELECTROLYTES
EMISSION SPECTRA
FILMS
LITHIUM COMPOUNDS
LITHIUM PHOSPHATES
LITHIUM SILICATES
OXYGEN COMPOUNDS
PHOSPHATES
PHOSPHORUS COMPOUNDS
SILICATES
SILICON COMPOUNDS
SPECTRA
SPUTTERING
THIN FILMS