Plasma diagnostic studies of the influence of process variable upon the atomic and molecular species ejected from (1 minus x )Li sub 4 SiO sub 4 : x Li sub 3 PO sub 4 targets during radio frequency magnetron sputtering

Journal Article · Wed May 01 04:00:00 EDT 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

DOI:https://doi.org/10.1116/1.577394· OSTI ID:5616569

Wachs, A L; Bates, J B; Dudney, N J; Luck, C F ^[1]

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1. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6056 (USA)

The deposition of thin-film electrolytes is a critical step in the development of lithium microbatteries with the potential for circuit integration. We have performed a preliminary study of the rf-magnetron sputtering of (1{minus}{ital x})Li{sub 4}SiO{sub 4}:{ital x}Li{sub 3}PO{sub 4} targets used to deposit amorphous thin-film electrolytes formed of the three-component system Li{sub 2}O--SiO{sub 2}--P{sub 2}O{sub 5}. Mass and optical emission spectroscopies have been used to investigate the effects of target composition and the deposition conditions upon the atomic and molecular species ejected from the targets. The data provide important information for understanding the mechanism of film formation and for monitoring the Li atomic flux onto the substrates during film growth.

• DOE Contract Number: AC05-84OR21400
• OSTI ID: 5616569
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 9:3; ISSN JVTAD; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360603* -- Materials-- Properties
ALKALI METAL COMPOUNDS
AMORPHOUS STATE
DEPOSITION
ELECTROLYTES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
EMISSION SPECTRA
EQUIPMENT
FILMS
LITHIUM COMPOUNDS
LITHIUM PHOSPHATES
LITHIUM SILICATES
MAGNETRONS
MASS SPECTROSCOPY
MICROWAVE EQUIPMENT
MICROWAVE TUBES
OXYGEN COMPOUNDS
PHOSPHATES
PHOSPHORUS COMPOUNDS
PLASMA DIAGNOSTICS
SILICATES
SILICON COMPOUNDS
SPECTRA
SPECTROSCOPY
SPUTTERING
TARGETS