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Deposition of electrolyte and cathode thin films by magnetron sputtering

Conference ·
OSTI ID:6112931
A variety of ceramic materials exhibit sufficiently high ionic and mixed ionic-electronic conductivities to make them useful as electrolytes and electrodes for batteries, sensors, fuel cells, electrochemical displays, and for other applications. The ability to fabricate these materials in thin-film form offers possibilities for the development of solid state, microsized electrochemical devices that could be incorporated into integrated circuits. An example of such a device is the thin-film, rechargeable lithium battery. This cell potentially could be fabricated directly onto an IC substrate to serve as a backup power source for a CMOS-SRAM memory. We have fabricated several of these thin-film cells using magnetron sputtering and electron beam evaporation to deposit the various layers. One of these cells produced a steady current of 1 ..mu..A at 3.2 volts. The performance of such thin-film cells after many charge-discharge cycles and their long term quiescent stability depend on the properties of the cathode and electrolyte films, as well as the anode-electrolyte and cathode-electrolyte junctions. Depositing films which minimize the resistance to lithium ion transport through the cell is a major challenge in the development of practical microbattery. In this paper, we summarize some recent results on the deposition and properties of lithium-ion conducting xLi/sub 4/SiO/sub 4/:yLi/sub 3/PO/sub 4/ glass electrolyte and V/sub 2/O/sub 5/ cathode films. 12 refs., 6 figs.
Research Organization:
Oak Ridge National Lab., TN (USA)
DOE Contract Number:
AC05-84OR21400
OSTI ID:
6112931
Report Number(s):
CONF-890421-9; ON: DE89013547
Country of Publication:
United States
Language:
English