Method for formation of high temperature superconductor films with reduced substrate heating
Patent
·
OSTI ID:6724728
This patent describes a method for forming a film of a ceramic superconductor material of the type requiring a high temperature post-deposition annealing step to form the superconducting phase on a substrate having an upper major surface. It comprises: depositing a layer of reflective material on the upper major surface of the substrate, the reflective material having a higher reflectivity than the superconducting material; depositing the ceramic superconductor material in a thin on the layer of reflective material; and heating the film by application of radiant energy to form a superconducting phase of the ceramic superconductor material.
- Assignee:
- NOV; NOV-90-023149; EDB-90-124066
- Patent Number(s):
- US 4931424; A
- Application Number:
- PPN: US 7-093304A
- OSTI ID:
- 6724728
- Country of Publication:
- United States
- Language:
- English
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