New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double-layered electrodes

Journal Article · Wed Dec 01 04:00:00 EST 1982 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.93378· OSTI ID:6719077

Shoji, A; Shinoki, F; Kosaka, S; Aoyagi, M; Hayakawa, H

All hard Josephson tunnel junctions, whose base and counter electrodes are composed of double-layered niobium nitride (NbN) and niobium (Nb) films, have been successfully fabricated by isolating a junction sandwich formed on a whole silicon wafer with a reactive ion etching technique. The reactive ion etching technique has been used for patterning both base and counterelectrodes, and self-aligning definition of junction areas has been performed. The fabricated junctions show good quality single-particle tunneling characteristics and excellent uniformity in critical currents.

• Research Organization: Electrotechnical Laboratory, 1-1-4 Umezono, Sakura-mura, Niihari-gun, Ibaraki 305, Japan
• OSTI ID: 6719077
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 41:11; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

420201* -- Engineering-- Cryogenic Equipment & Devices
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALIGNMENT
CHARGED PARTICLES
CHEMICAL REACTIONS
CRITICAL CURRENT
CURRENTS
DATA
ELECTRIC CURRENTS
ELECTRODES
ELEMENTS
ETCHING
EXPERIMENTAL DATA
FABRICATION
FILMS
INFORMATION
IONS
JOSEPHSON JUNCTIONS
JUNCTIONS
LAYERS
METALS
NIOBIUM
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN COMPOUNDS
NUMERICAL DATA
PERFORMANCE
PNICTIDES
SUPERCONDUCTING JUNCTIONS
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNNEL EFFECT