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Monolithic photovotaic PbS-on-Si infrared-sensor array

Journal Article · · IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (USA)
DOI:https://doi.org/10.1109/55.46915· OSTI ID:6715068
; ; ;  [1];  [2]
  1. Arbeitsgemeinschaft fur Industrielle Forschung, Swiss Federal Inst. of Tech., ETH-Honggerberg, CH-8093 Zurich (CH)
  2. Shizuoka Univ., Hamamatsu (Japan). Faculty of Engineering
The authors have grown epitaxial narrow-gap PbS-on-Si substrates using a stacked CaF{sub 2}-BaF{sub 2} intermediate buffer layer, and have fabricated linear arrays of photovoltaic infrared (IR) sensors in the PbS layer for the first time. The sensors of the array exhibit resistance-area products at zero bias of 3{Omega}{center dot}cm{sup 2} at 200 K (3.4-{mu}m cutoff wavelength) and 2{center dot}10{sup 5} {Omega}{center dot}cm{sup 2} at 84 K (4-{mu}m cutoff), with corresponding detectivities of 2{center dot}10{sup 10} and 1{center dot}10{sup 13}cm{center dot}{radical}Hz/W, respectively.
OSTI ID:
6715068
Journal Information:
IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (USA), Journal Name: IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (USA) Vol. 11:1; ISSN EDLED; ISSN 0741-3106
Country of Publication:
United States
Language:
English