Soft x-ray projection lithography using an x-ray reduction camera

Journal Article · Tue Nov 01 04:00:00 EST 1988 · J. Vac. Sci. Technol., B; (United States)

DOI:https://doi.org/10.1116/1.584107· OSTI ID:6710709

Hawryluk, A M; Seppala, L G

Soft x-ray projection lithography can now be realized with recent developments in x-ray optics. Using new x-ray optical components and spherical imaging optics, we have designed an x-ray reduction camera which is capable of projecting with soft x-ray radiation, a 5 x demagnified image of a mask onto a resist coated wafer. The resolution of this design is /similar to/00 nm with a depth of focus of +- 5.6 /mu/m and a 0.5-cm-diam image field. We use x-ray reflecting masks (patterned x-ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free. Our design uses a laser produced plasma for the x-ray source. Better resolution and/or larger areas are possible with improvements in optic figures and source characteristics.

• Research Organization: Lawrence Livermore National Laboratory, University of California, Livermore, California 94550
• OSTI ID: 6710709
• Journal Information: J. Vac. Sci. Technol., B; (United States), Journal Name: J. Vac. Sci. Technol., B; (United States) Vol. 6:6; ISSN JVTBD
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420800 -- Engineering-- Electronic Circuits & Devices-- (-1989)
440300* -- Miscellaneous Instruments-- (-1989)
47 OTHER INSTRUMENTATION
CAMERAS
DESIGN
EQUIPMENT
OPTICAL SYSTEMS
RESOLUTION
X-RAY EQUIPMENT