Reflection masks for soft x-ray projection lithography

Conference · Mon Jul 01 00:00:00 EDT 1991

OSTI ID:10148705

Hawryluk, A M; Ceglio, N M; Phillion, D W; Gaines, D P ^[1]; Browning, R; Pease, R F ^[2]; Stewart, D; Economou, N ^[3]

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1. Lawrence Livermore National Lab., CA (United States)
2. Stanford Univ., CA (United States). Center for Integrated Systems
3. Micrion Corp., Peabody, MA (United States)

Soft X-ray Project Lithography (SXPL) may be used to fabricate high resolution structures for future integrated circuits. This technique will use a reflection mask which is a substrate coated with an x-ray multilayer mirror and patterned with a thin ({approximately}50 nm) layer of x-ray absorber. Mask patterning processes must not degrade the reflectivity of the x-ray mirror and mask repair techniques must be developed. The technical challenges of conventional reflecting optical imaging system designs are severe and mask technology can have a significant impact on this issue. Specifically, innovative mask designs can reduce the complexity of the optical system by decreasing the number of mirrors and replacing aspheric optical surfaces with spherical surfaces. We have developed a technique, called Encoded Mask Lithography, with which we have designed an optical system which uses only two (spherical) imaging mirrors and has < 100 nm spatial resolution, negligible distortion and > 30 mm diameter field of view.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 10148705
• Report Number(s): UCRL-JC-108669; CONF-9107115-76; ON: DE92014779
• Resource Relation: Conference: Society of Photo-Optical Instrumentation Engineers (SPIE) meeting,San Diego, CA (United States),21-26 Jul 1991; Other Information: PBD: Jul 1991
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
42 ENGINEERING
MASKING
REFLECTIVE COATINGS
INTEGRATED CIRCUITS
X-RAY EQUIPMENT
X-RAY DIFFRACTION
MIRRORS
LAYERS
SUBSTRATES
OPTICAL SYSTEMS
665300
426000
INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
COMPONENTS
ELECTRON DEVICES AND CIRCUITS