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Low-temperature ion beam mixing of Al-Sb

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.92329· OSTI ID:6646389
The mixing of Sb layers on Al by 400-keV Xe ions at 80 K has been investigated. A tail in the Sb concentration profile is observed to move into the Al substrate to the depth of the Xe range. The quantity of mixed Sb in the tail increases linearly with Xe fluence. No growth of layers corresponding to a binary compound is observed. However, the Sb concentration in the original layer drops continuously until the concentration reaches the first equilibrium compound phase, AlSb. The present results are believed to demonstrate pure collisional mixing of Sb into Al without the competing effects of enhanced diffusion since (i) vacancies are immobile in Al at 80 K and (ii) the observed rate of mixing, approx. =2.5 Sb per Xe, is consistent with recent theoretical estimates of collisional mixing due to ion recoil and ion cascade events.
Research Organization:
Sandia National Laboratories, Albuqerque, New Mexico 87185
OSTI ID:
6646389
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 38:4; ISSN APPLA
Country of Publication:
United States
Language:
English