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Pulsed laser annealing of ion-implanted semiconducting GaAs for homojunction solar cells

Journal Article · · Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)
OSTI ID:6638289
The results of a study whose purpose was to evaluate the combination of ion implantation followed by pulsed ruby laser annealing (II/PLA), as a method for shallow p-n junction formation in semiconducting GaAs substrates, are reported. High dose Zn, Mg, Si and se implants were used. PLA was carried out in air without encapsulation, and with thin sputtered SiO/sub 2/ encapsulation layers. The combination of I-V, C-V, SEM, TEM and SIMS measurements that were carried out have important implications for photovoltaic applications including the possibility of forming planar junctions, the choice of implanted ions to obtain high electrical activation, the optimum pulsed laser energy density range, the resultant junction depth and electrical characteristics, and the presence of laser- and implantation-induced residual defects.
Research Organization:
Oak Ridge National Lab., TN
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
6638289
Journal Information:
Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States), Journal Name: Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States); ISSN CRCND
Country of Publication:
United States
Language:
English