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TEM studies of defects in laser annealed gallium arsenide

Conference ·
OSTI ID:6627458
The nature and depth distribution of residual damage in ion implanted and pulsed laser annealed GaAs have been studied using both plan-view and cross-section transmission electron microscopy (TEM) specimens for high dose implants (5.0 x 10/sup 15/ cm/sup -2/; Zn/sup +/, Se/sup +/, Mg/sup +/, Si/sup +/). For laser annealing of unencapsulated GaAs, the surface of the GaAs was degraded. The use of thin (approx. 300 to 500 A) layers of SiO/sub 2/ for encapsulation was found to substantially reduce this surface degradation.
Research Organization:
Oak Ridge National Lab., TN (USA)
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
6627458
Report Number(s):
CONF-810446-2(Draft)
Country of Publication:
United States
Language:
English