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Doping and transport studies in In/sub x/Ga/sub 1-x/As/GaAs strained-layer superlattices

Conference ·
OSTI ID:6598737

High-quality In/sub x/Ga/sub 1-x/As/GaAs strained-layer superlattices (SLS's), with 0.11 less than or equal to x less than or equal to 0.20, have been grown by molecular-beam epitaxy. The test structures grown include the first doped material in this SLS system, with Si being used for n-type doping and Be for p-type. A number of structures with up to 80 superlattice periods and with layer thicknesses in the 40 to 140 A range have been characterized by x-ray diffraction and optical techniques. Doped specimens have been characterized by C-V profiling and, for diode structures, by I-V, four-terminal resistivity, and Hall-effect measurements. Hall mobilities (parallel to the layers) are comparable to those of high-quality bulk alloy material, further evidence of the high crystalline quality possible in multilayer structures with thin, highly-mismatched (> 1%) layers. 5 figures.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6598737
Report Number(s):
SAND-82-1847C; CONF-821219-1; ON: DE83003915
Country of Publication:
United States
Language:
English