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Doping and transport studies in In/sub x/Ga/sub 1-x/As/GaAs strained-layer superlattices

Journal Article · · J. Vac. Sci. Technol., B; (United States)
DOI:https://doi.org/10.1116/1.582563· OSTI ID:5771225

High quality In/sub x/Ga/sub 1-x/As/GaAs strained-layer superlattices (SLS's), with 0.11< or =x< or =0.20, have been grown by molecular beam epitaxy. The test structures grown include the first doped material in this SLS system, with Si being used for n-type doping and Be for p-type. A number of structures with up to 80 superlattice periods and with layer thicknesses in the 40--140 A range have been characterized by x-ray diffraction and optical techniques. Doped specimens have been characterized by C--V profiling and, for diode structures, by I--V, four-terminal resistivity, and Hall-effect measurements. Hall mobilities (parallel to the layers) at 23 /sup 0/C are comparable to those of high quality bulk alloy material, further evidence of the high crystalline quality possible in multilayer structures with thin, highly mismatched (>1%) layers.

Research Organization:
Sandia National Laboratories, Albuquerque, New Mexico, 87185
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5771225
Journal Information:
J. Vac. Sci. Technol., B; (United States), Journal Name: J. Vac. Sci. Technol., B; (United States) Vol. 1:2; ISSN JVTBD
Country of Publication:
United States
Language:
English